A new method is presented for microfabricating silicon-based neural probes that are designed for neurobiology research. Such probes provide unique capabilities to record high-resolution signals simultaneously from multiple, precisely defined locations within neural tissue. The fabrication process utilizes a plasma etch to define the probe outline, resulting in sharp tips and compatibility with standard CMOS processes. A low-noise amplifier array has been fabricated through the MOSIS service to complete a system that has been used in multiple successful physiological experiments.
 

Kewley, D. T., Hills, M. D., Borkholder, D. A., Opris, I. E., Maluf, N. I., Storment, C. W., Bower, J. M., and Kovacs, G. T. A., "Plasma-Etched Neural Probes," Sensors and Actuators A, vol. 58, no. 1, Jan. 1997, pp. 27 - 35.